Category
Refractometers for Semiconductor Fabs
Inline concentration monitoring of process chemicals in semiconductor fabs.
Semiconductor wet processes depend on tightly controlled chemical concentrations in cleaning, etching and stripping baths, where a drift can ruin wafers. The KxS DCM-10 monitors semiconductor wet chemical concentration inline and continuously, unaffected by bubbles or flow.
1 Product · Semiconductor
Selection guide
Refractometers for Semiconductor Fabs Guide
What the DCM-10 is used for in semiconductor fabs
Semiconductor wet processes depend on tightly controlled chemical concentrations in cleaning, etching and stripping baths. A drift in concentration can ruin wafers, so fabs need to catch it as it happens rather than at the next lab sample. The DCM-10 gives continuous inline concentration measurement for exactly that purpose.
How to choose a refractometer for semiconductor wet chemicals
- Measurement: the DCM-10 uses optical measurement, unaffected by bubbles or flow, so bath agitation doesn't disturb the reading.
- Control: it gives real-time data for chemical blending and bath replenishment, so make-up chemical is added before concentration drifts out of spec.
- Typical duty: wet bench and bath concentration, chemical blending and dilution systems, and chemical delivery monitoring.
- Chemical match: tell us the chemical and concentration range and we'll confirm the right DCM-10 configuration.
For other process industries using the same KxS platform, see inline process refractometers.
FAQ
Common questions
What does the DCM-10 measure in a semiconductor fab?
The concentration of semiconductor wet chemicals, inline and in real time, in wet bench baths, blending systems and chemical delivery lines, so drift is caught immediately rather than at the next lab sample.
Why monitor semiconductor bath concentration continuously?
Concentration drifts as chemicals are consumed and evaporate during wafer processing. Continuous monitoring with the DCM-10 lets you replenish the bath before the drift is large enough to affect wafer results.
Does bubbling or agitation affect the DCM-10 reading?
No. The DCM-10 uses optical measurement that's unaffected by bubbles or flow, so it reads accurately even in an actively bubbled or agitated wet bench bath.
Can the DCM-10 be used with other semiconductor chemicals?
Tell us the chemical and concentration range, and we'll confirm the right KxS DCM-10 configuration for your wet bench, blending or delivery monitoring application, including the optical measurement setup for that chemistry.
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