Categories Liquid & Gas Analysis, Semiconductor
Concentration monitor DCM-10 for semiconductor wet chemicals control
Brand : KXS
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Categories Liquid & Gas Analysis, Semiconductor
Concentration monitor DCM-10 for semiconductor wet chemicals control
Brand : KXS
When it comes to balancing cost, speed, and accuracy in semicon chemical concentration measurements throughout the fab distribution chain, in-situ refractive index has become the industry standard.
Experience unparalleled precision and efficiency in your chemical monitoring processes with KxS Technologies' advanced solutions and expertise.
Introducing the KxS semiconductor monitor DCM-10, a cutting-edge optical refractometer designed for real-time monitoring of wet chemicals in almost all processing steps that involve wafer processing with liquid chemicals or mixtures. The DCM-10 is renowned for its high accuracy and reliability, making it an essential concentration monitoring tool for incoming chemical check, wafer cleaning, chemical etching and chemical mechanical planarization (CMP).
The DCM-10 operates with a 24 VDC input power supply and offers flexible communication options, including analog (4-20 mA) and digital (Modbus TCP). When using the analog signal, the digital port serves as a service port for configuration and diagnostics via a computer web browser, external display, or mobile device. All port options can be utilized simultaneously, providing seamless integration and monitoring capabilities.
Factory calibrated for refractive index measurements, the DCM-10 displays temperature-compensated concentration units in % by weight or g/cm³. This ensures accurate and consistent monitoring of chemical concentrations, critical for maintaining process integrity and quality.
In the fast-evolving semiconductor industry, precision in chemical concentration measurement is critical to ensuring process stability, yield optimization, and cost efficiency.
KxS Technologies’ in-situ refractive index measurement technology balances cost, speed and accuracy in providing real-time monitoring to maintain chemical integrity, reduce waste, and enhance process control throughout the fab distribution chain.
Our sensors are used in blender systems achieving the correct concentration of constituents in SC-1 and SC-2 cleaning solutions being essential for effective particle removal and surface preparation.
Along with an increasingly complex chemical supply chain new ways in generating chemicals onsite are advocated. Blenders generating bulk 29% NH₃(aq) from ammonia gas and water adopt the DCM-10 refractometer for ensuring the formation of ammonia liquid to its bulk concentration. Refractive index is uniquely a good match in the entire ammonia concentration range 0-30%wt.
Anisotropic wet etching of silicon with 50% potassium hydroxide (KOH) demands precise control to achieve smooth, accurate etching profiles, particularly in MEMS and deep etch applications.
Titanium etching requires balanced acid blends of sulfuric acid (H₂SO₄), nitric acid (HNO₃), and phosphoric acid (H₃PO₄) to ensure efficient material removal while minimizing defects and over-etching. Our technology provides continuous monitoring for optimized concentration levels.
The selective etching of polycrystalline silicon on wafer back sides requires precise HF:HNO₃ concentration control to maintain process uniformity.
Chemical mechanical planarization (CMP) introduces contaminants that must be effectively removed using post-CMP cleaning solutions. Our sensors optimize cleaning bath life and ensure proper chemical balance for consistent wafer surface quality.